Sputtering target with backing plate
WebWe also supply Backing Plates for this process. The reliability of the bond between a sputtering target and backing plate is essential to ensure optimised performance. Call us on +44 (0) 1827 259250 or contact us using the 'Request Quote' button above to fully discuss your target bonding requirements with one of our Technical Sales Executives. WebProvided is a sputtering target-backing plate assembly where a raw material powder prepared so as to have the composition of a magnetic material sputtering target is filled …
Sputtering target with backing plate
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WebWe supply round and custom sputter targets, fabricate backing plates and provide target bonding service at a very nominal cost. Wide variety of materials ready to ship. High purity Metal pellets, Metal oxide, Magnesium Fluoride, Zinc sulfide pieces and granules; 2in to 8in round sputter targets with high density and purity WebKDF utilizes a variety of sputtering techniques to bond targets to various backing plates. Indium and indium alloys are used to develop a high strength bond and insure the thermal transfer and conduction needed for today’s high powered sputtering systems.
http://www.bushorchimp.com/pz633654e-cz595be73-low-vapor-pressure-niobium-alloy-sheet-for-sputtering-target-astm-b392-98.html Web4 Oct 2024 · Apparatus and methods for flipping substrates in vacuum between PVD sputtering of each side for increasing throughput are provided herein. In some embodiments disclosed herein, a module of a processing system for flipping a substrate in vacuum is provided. The module includes a clamp assembly for securing the substrate, a first motor …
WebBonding such targets to a suitable backing plate are highly recommended to the target, once cracked, stays together. A cracked target will still be sputtered providing plasma has … WebHigh purity sputtering targets are available in a variety of geometries, including planar, circular, conical, rectangular, ring, delta and custom configurations. KDF incorporates material processing techniques that include: Vacuum induction melting Vacuum/ inert hot pressing Hot/cold isostatic pressing Electron beam melting
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Web8 May 2024 · Most sputtering targets are bonded to copper backing plates or copper sheet, as this material offers enhanced thermal conductivity. Kamis also offers other sputtering target backing plate options including stainless steel, molybdenum and aluminum. phone number area code 351WebBuy Tellurium 99.999% pure Sputtering Target, 2 inch x 4mm, bonded to Cu, ACI Alloys in San Jose, California, United States, for US $2300. Here we have a tellurium 99.999% pure sputtering target: * Dimensions 2 inch diameter x 4mm thick. * It comes bonded to a 2mm copper backing plate. *Please see the photo, which shows some surface porosity. phone number apple support in the statesWebNiobium Products Niobium Sheet High Purity Used For Sputtering Target ASTM B392-98. 1.Description. Being a high temperatures and corrosive materials, niobium sheet and strip is commonly used in the industrial diamonds production, deep draw application and also chemical industrial with medical fields. Additionally niobium is used to make colored ... how do you pronounce gagnonWebBenefits of Bonding Sputtering Targets 1. A material can transfer heat through its thickness faster when the material is thinner. For most sputtering R&D guns, the thickness of the … how do you pronounce gahanna ohioWebAu Target, Diameter: 2 Inch / 3 Inch / as required, Thickness 1 mm / 2 mm / as required, Purity 99.99% / as required, with or without Copper backing plate how do you pronounce gailWebAs a ceramic material, tungsten carbide requires high temperatures of 1,900 to 2,200°C for compression. We therefore produce our targets using hot presses and thereby achieve at least 99% of the theoretical density. As a result, no powder particles are released from the target during sputtering and the coating adheres perfectly. how do you pronounce gagneWebPROBLEM TO BE SOLVED: To provide a Sb-Te sputtering target which effectively prevents generation of particles, abnormal electric discharge, generation of nodules, occurrence of cracks or breakage, etc., in sputtering and of which the oxygen content is reduced; its production method; and a powder for sintering suitable for producing the sputtering … how do you pronounce galatea